Nikon today announced the installation of the world’s first ever 450 mm immersion scanner, the Nikon NSR-S650D at SUNY Polytechnic Institute’s Colleges of Nanoscale Science and Engineering (SUNY Poly CNSE) and is transitioning to wafer patterning. This milestone is a significant achievement in accelerating development of the next generation of computer chips.
In July of 2013, Nikon entered into a partnership with SUNY Polytechnic’s College of Nanoscale Science and Engineering to develop next generation 450 mm photolithography technology. In April of this year, Governor Andrew M. Cuomo announced installation of the world’s first ever 450 mm immersion scanner had begun at the SUNY Polytechnic Institute’s Albany NanoTech Complex.
